Picture and Location Background Description: Plasma Etcher for semi-clean (not contaminated) metals (Al, W, Ti), silicon dioxide, silicon nitride and polysilicon. Features: Wafer Size -- 4 inch wafers only. August Burns Red Messengers Rar.

The Applied Materials Precision 5000 Etcher is. Chemical Vapor Deposition. The following information is provided to users of the Applied Materials Precision. APPLICATION NOTES. AMAT P5000 CVD CHAMBER. Problem: Processes that deposit a nitride passivation layer develop a residue on the inside of the chamber that is very. Assassin Game Generator. Introduced in April 1987, the Applied Precision 5000 is the original Applied Materials cluster tool and one of the industry’s first single-wafer, multi-chamber. Introduced in April 1987, the Applied Precision 5000 is the original Applied Materials cluster tool and one of the industry’s first single-wafer, multi-chamber.